X-ray reflectivity of the AXAF Veta-I optics

Edwin M. Kellogg; George Chartas; Dale E. Graessle; John P. Hughes; Leon P. Van Speybroeck; Ping Zhao; Martin C. Weisskopf; Ronald F. Elsner; Stephen L. O'Dell

doi:10.1117/12.140552

21 January 1993 X-ray reflectivity of the AXAF VETA-I optics

Edwin M. Kellogg, George Chartas, Dale E. Graessle, John P. Hughes, Leon P. Van Speybroeck, Ping Zhao, Martin C. Weisskopf, Ronald F. Elsner, Stephen L. O'Dell

Author Affiliations +

Proceedings Volume 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography; (1993) https://doi.org/10.1117/12.140552
Event: San Diego '92, 1992, San Diego, CA, United States

Abstract

The study measures the X-ray reflectivity of the AXAF VETA-I optic and compares it with theoretical predictions. Measurements made at energies of 0.28, 0.9, 1.5, 2.1, and 2.3 keV are compared with predictions based on ray trace calculations. Results on the variation of the reflectivity with energy as well as the absolute value of the reflectivity are presented. A synchrotron reflectivity measurement with a high-energy resolution over the range 0.26 to 1.8 keV on a flat Zerodur sample is also reported. Evidence is found for contamination of the flat by a thin layer of carbon on the surface, and the possibility of alteration of the surface composition of the VETA-I mirror, perhaps by the polishing technique. The overall agreement between the measured and calculated effective area of VETA-I is between 2.6 and 10 percent. Measurements at individual energies deviate from the best-fitting calculation to 0.3 to 0.8 percent, averaging 0.6 percent at energies below the high energy cutoff of the mirror reflectivity, and are as high as 20.7 percent at the cutoff.

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Edwin M. Kellogg, George Chartas, Dale E. Graessle, John P. Hughes, Leon P. Van Speybroeck, Ping Zhao, Martin C. Weisskopf, Ronald F. Elsner, and Stephen L. O'Dell "X-ray reflectivity of the AXAF VETA-I optics", Proc. SPIE 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography, (21 January 1993); https://doi.org/10.1117/12.140552

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