Low absorption measurements of optical thin films at 10.6 microns

Jean DiJon; Erik Duloisy; Philippe Lyan

doi:10.1117/12.141012

4 March 1993 Low absorption measurements of optical thin films at 10.6 microns

Jean DiJon, Erik Duloisy, Philippe Lyan

Proceedings Volume 1782, Thin Films for Optical Systems; (1993) https://doi.org/10.1117/12.141012
Event: Optical Systems Design '92, 1992, Berlin, Germany

Abstract

To extract the extinction coefficient k at 10.6 micrometers of thin films or bare substrates, we present new data analysis of photo thermal measurements. We successively show how to obtain k using analytical formulation taking into account substrate absorption and how to minimize experimental errors. Then we discuss accuracy and reliability for substrates, thin films, and mirrors. Results are given for k values as low as 10^-4 for thin films, 10^-8 for substrates, and mirror reflectivities higher than 99.8% have been measured.

Citation Download Citation

Jean DiJon, Erik Duloisy, and Philippe Lyan "Low absorption measurements of optical thin films at 10.6 microns", Proc. SPIE 1782, Thin Films for Optical Systems, (4 March 1993); https://doi.org/10.1117/12.141012

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