Preparation and properities of high-index oxide films for application to laser optics

Dieter Schaefer; V. Guepner; Reinhard Wolf; Bernhard Steiger; G. Pfeifer; J. Franke

doi:10.1117/12.141046

4 March 1993 Preparation and properities of high-index oxide films for application to laser optics

Dieter Schaefer, V. Guepner, Reinhard Wolf, Bernhard Steiger, G. Pfeifer, J. Franke

Proceedings Volume 1782, Thin Films for Optical Systems; (1993) https://doi.org/10.1117/12.141046
Event: Optical Systems Design '92, 1992, Berlin, Germany

Abstract

HfO₂, Y₂0₃, and Sc₂O₃ thin films and multilayer systems in combination with SiO₂ as a low index component were deposited by laser beam evaporation. Absorption was measured by photothermal displacement spectroscopy at the wavelength of 1060 nm, whereas laser damage thresholds were determined at 248 and 1060 nm. Relations between laser damage, absorption, and thin film preparation are investigated.

Citation Download Citation

Dieter Schaefer, V. Guepner, Reinhard Wolf, Bernhard Steiger, G. Pfeifer, and J. Franke "Preparation and properities of high-index oxide films for application to laser optics", Proc. SPIE 1782, Thin Films for Optical Systems, (4 March 1993); https://doi.org/10.1117/12.141046

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