Paper
16 February 1993 Shadow-masked growth and its applications
Piet M. A. Demeester, G. Coudenys, Gerrit Vermeire, Ingrid Moerman, Youcai Zhu, Luc Buydens, C. Eeckhout, Peter Van Daele
Author Affiliations +
Abstract
In this paper we will review the shadow masked growth technique and its applications. The technique enables us to change the layer thicknesses over a substrate by the variation in dimensions of windows in the shadow mask. One of the major application areas is the realization of photonic integrated circuits where materials with a different bandgap have to be integrated on the same substrate. The combination of thickness variations with the use of quantum wells results in the required bandgap changes. In the paper we will first start with an overview of the basic technology of shadow masked growth and in a second part we will discuss some of the important applications. Note that we will limit ourselves to the shadow masked growth technique and no review will be given on other technologies such as selective growth.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Piet M. A. Demeester, G. Coudenys, Gerrit Vermeire, Ingrid Moerman, Youcai Zhu, Luc Buydens, C. Eeckhout, and Peter Van Daele "Shadow-masked growth and its applications", Proc. SPIE 1788, Sources and Detectors for Fiber Communications, (16 February 1993); https://doi.org/10.1117/12.141115
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KEYWORDS
Photomasks

Quantum wells

Waveguides

Gallium arsenide

Light emitting diodes

Sensors

Etching

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