Modeling of high-density plasma sources

David B. Graves; Han-Ming Wu; Robert K. Porteous

doi:10.1117/12.142910

16 April 1993 Modeling of high-density plasma sources

David B. Graves, Han-Ming Wu, Robert K. Porteous

Proceedings Volume 1803, Advanced Techniques for Integrated Circuit Processing II; (1993) https://doi.org/10.1117/12.142910
Event: Microelectronic Processing '92, 1992, San Jose, CA, United States

Abstract

The two-dimensional, axisymmetric model of a bounded, partially ionized, magnetized glow discharge plasma is presented. The model treats positive ions as particles and electrons as a fluid in a hybrid configuration. The results reported here are directed towards simulating an electron cyclotron resonance (ECR), microwave-sustained plasma. Results include predictions of plasma density and potential, electron temperature and ion flux and energy. Models such as the one presented here have the potential to be used by plasma process engineers and plasma tool designers.

Citation Download Citation

David B. Graves, Han-Ming Wu, and Robert K. Porteous "Modeling of high-density plasma sources", Proc. SPIE 1803, Advanced Techniques for Integrated Circuit Processing II, (16 April 1993); https://doi.org/10.1117/12.142910

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