Ionization yield in a three-step photoionization process of an optically thick atomic column: numerical modelization and experiments in atomic thulium

Philippe Kupecek; M. Comte; Jacques De Lamare; Alain Denis Petit

doi:10.1117/12.145512

28 May 1993 Ionization yield in a three-step photoionization process of an optically thick atomic column: numerical modelization and experiments in atomic thulium

Philippe Kupecek, M. Comte, Jacques De Lamare, Alain Denis Petit

Author Affiliations +

Proceedings Volume 1859, Laser Isotope Separation; (1993) https://doi.org/10.1117/12.145512
Event: OE/LASE'93: Optics, Electro-Optics, and Laser Applications in Scienceand Engineering, 1993, Los Angeles, CA, United States

Abstract

Among the mainly interesting parameters of an atomic vapor laser isotope separation process is the ionization yield. This parameter can be controlled as long as the laser beam spatial intensity distribution and temporal shape are well defined and not subjected to unexpected disturbing effects such as coherent propagation phenomena, leading to spatial and temporal reshaping with hot spots and pulse lengthening and delays. On the other hand, economical considerations require optically thick atomic columns which can favor such effects. In this work, we study the photoionization yield in atomic thulium vapor when propagation effects occur. We compare our experimental results with those of a coherent propagation code describing a four level system and including inhomogeneous broadening as well as degeneracies. We choose a three step photoionization scheme.

Citation Download Citation

Philippe Kupecek, M. Comte, Jacques De Lamare, and Alain Denis Petit "Ionization yield in a three-step photoionization process of an optically thick atomic column: numerical modelization and experiments in atomic thulium", Proc. SPIE 1859, Laser Isotope Separation, (28 May 1993); https://doi.org/10.1117/12.145512

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