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13 November 1980 Fabrication Of Precision Optical Elements Using Phase Measuring Interferometric Tests
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Proceedings Volume 0190, Los Alamos Conference on Optics 1979; (1980) https://doi.org/10.1117/12.957725
Event: Los Alamos Conference on Optics '79, 1979, Los Alamos, United States
Abstract
Fabrication of high quality optical surfaces requires both sensitive methods of evaluating surface characteristics and delicate control of fabrication techniques. Interferometers which yield half wave data have been augmented by computer controlled phase measuring techniques which are capable of greater accuracy and flexible real time data analysis. Key elements of the Phase Measuring Interferometer (PMI) system are a modified Twyman Green interferometer, a piezo driven reference mirror, detector, interface, and minicomputer system containing a graphic display, keyboard, and dry copier. Wavefront data are obtained by a direct measurement of phase difference over the aperture on a 32 x 32 element array. Several programs have been written to augment the capability of the basic system. System capabilities include standard isometric contour maps at variable sensitivity, wavefront subtraction and calibration modes, wavefront averaging, calculation and display of the MTF and Point Spread Function, determination of tilt and power over subapertures with respect to a defined standard aperture, and deconvolution of wavefront data to yield aberration coefficients.
© (1980) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ronald T. Grosso "Fabrication Of Precision Optical Elements Using Phase Measuring Interferometric Tests", Proc. SPIE 0190, Los Alamos Conference on Optics 1979, (13 November 1980); https://doi.org/10.1117/12.957725
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