Blazed Holographic Gratings By Selective Etching In Silicon

J. Muller; R. Nietz; U. Unrau

doi:10.1117/12.957865

25 December 1979 Blazed Holographic Gratings By Selective Etching In Silicon

J. Muller, R. Nietz, U. Unrau

Proceedings Volume 0192, Interferometry; (1979) https://doi.org/10.1117/12.957865
Event: 23rd Annual Technical Symposium, 1979, San Diego, United States

Abstract

Holographic exposure and selective etching in silicon are combined to fabricate high-precision gratings with nearly arbitrary blaze angle and flat surfaces. The process starts with commercially available silicon wafers, the surfaces of which are oriented at the desired angle to a {1 1 1} plane. Gratings between 0.5μm and 5 μm have been realized with holographic and mask exposure. Efficiencies up to 90% have been measured. Furthermore, simple tools for quick and high-precision alignment of the holographic equipment are described.

Citation Download Citation

J. Muller, R. Nietz, and U. Unrau "Blazed Holographic Gratings By Selective Etching In Silicon", Proc. SPIE 0192, Interferometry, (25 December 1979); https://doi.org/10.1117/12.957865

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