Accelerated radiation damage testing of x-ray mask membrane materials

Philip A. Seese; Kevin D. Cummings; Douglas J. Resnick; Arnold W. Yanof; William A. Johnson; Gregory M. Wells; John P. Wallace

doi:10.1117/12.146527

24 June 1993 Accelerated radiation damage testing of x-ray mask membrane materials

Philip A. Seese, Kevin D. Cummings, Douglas J. Resnick, Arnold W. Yanof, William A. Johnson, Gregory M. Wells, John P. Wallace

Author Affiliations +

Proceedings Volume 1924, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III; (1993) https://doi.org/10.1117/12.146527
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

An accelerated test method and resulting metrology data are presented to show the effects of x- ray radiation on various x-ray mask membrane materials. A focused x-ray beam effectively reduces the radiation time to 1/5 of that required by normal exposure beam flux. Absolute image displacement results determined by this method indicate imperceptible movement for boron-doped silicon and silicon carbide membranes at a total incident dose of 500 KJ/cm², while image displacement for diamond is 50 nm at 150 KJ/cm² and silicon nitride is 70 nm at 36 KJ/cm². Studies of temperature rise during the radiation test and effects of the high flux radiation, i.e., reciprocity tests, demonstrate the validity of this test method.

Citation Download Citation

Philip A. Seese, Kevin D. Cummings, Douglas J. Resnick, Arnold W. Yanof, William A. Johnson, Gregory M. Wells, and John P. Wallace "Accelerated radiation damage testing of x-ray mask membrane materials", Proc. SPIE 1924, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III, (24 June 1993); https://doi.org/10.1117/12.146527

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