Blended novolac resins with improved lithographic performance

Thomas J. Lynch; Chet J. Sobodacha; Valerie R. Paradis; Dana L. Durham; Anthony Canize

doi:10.1117/12.154795

15 September 1993 Blended novolac resins with improved lithographic performance

Thomas J. Lynch, Chet J. Sobodacha, Valerie R. Paradis, Dana L. Durham, Anthony Canize

Proceedings Volume 1925, Advances in Resist Technology and Processing X; (1993) https://doi.org/10.1117/12.154795
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

Statistically designed experiments were performed to optimize novolac blending techniques which would yield superior photoresists. The best lithographic performance was obtained when two novolacs to be blended had dissimilar relative molecular weights (RMW) while also having matched dissolution rates (DR), (lithographic performance equals (RMW_A - RMW_B)/(DR_A - DR_B). A calculated plot of (RMW_A - RMW_B)/(DR_A - DR_B) matched the experimental plot of lithographic performance well.

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Thomas J. Lynch, Chet J. Sobodacha, Valerie R. Paradis, Dana L. Durham, and Anthony Canize "Blended novolac resins with improved lithographic performance", Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); https://doi.org/10.1117/12.154795

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