Effect of surface inhibition on process latitudes

Casper A. H. Juffermans; Han J. Dijkstra; Yvonne Verhulst-van Hout

doi:10.1117/12.154788

15 September 1993 Effect of surface inhibition on process latitudes

Casper A. H. Juffermans, Han J. Dijkstra, Yvonne Verhulst-van Hout

Proceedings Volume 1925, Advances in Resist Technology and Processing X; (1993) https://doi.org/10.1117/12.154788
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

In extending the latitudes of high-contrast positive i-line resists both bulk development contrast and surface inhibition are important. Measurements of these parameters with a DRM show large variations when the resist thickness and baking conditions are varied. The relative importance of both contributions on especially the focus latitude are studied. Using the measurements of bulk contrast and surface inhibition time our i-line resist processing is optimized.

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Casper A. H. Juffermans, Han J. Dijkstra, and Yvonne Verhulst-van Hout "Effect of surface inhibition on process latitudes", Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); https://doi.org/10.1117/12.154788

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