Evaluation of a new zirconium-containing, negative-working, single-layer resist with enhanced oxygen and fluorocarbon reactive-ion etch resistance

Ashwin S. Ramachandran; Treva Long; Ferdinand Rodriguez

doi:10.1117/12.154775

15 September 1993 Evaluation of a new zirconium-containing, negative-working, single-layer resist with enhanced oxygen and fluorocarbon reactive-ion etch resistance

Ashwin S. Ramachandran, Treva Long, Ferdinand Rodriguez

Author Affiliations +

Proceedings Volume 1925, Advances in Resist Technology and Processing X; (1993) https://doi.org/10.1117/12.154775
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

Resists for use in electron beam lithography usually have been made using polymers alone, or polymers with monomeric additives. The monomer may perform the role of a plasticizer or a sensitizer to radiation or enhance the reactive-ion resistance of the imaged resist. In the present work, a new approach was used. A negative working resist system containing two monomers, zirconyl dimethacrylate (ZrDMA) and dipentaerythritol pentaacrylate (DPEPA), was lithographically evaluated. The DPEPA acts as a sensitizer to electron beam radiation by enhancing exposure-induced crosslinking, while the presence of zirconium in the form of an organometallic results in the formation of an oxide based barrier to etch in oxygen and CF₄/O₂ plasmas. This results in a drop in the etch rate with time in situ.

Citation Download Citation

Ashwin S. Ramachandran, Treva Long, and Ferdinand Rodriguez "Evaluation of a new zirconium-containing, negative-working, single-layer resist with enhanced oxygen and fluorocarbon reactive-ion etch resistance", Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); https://doi.org/10.1117/12.154775

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