Hydrosiloxane-modified styrene-diene block copolymer resists

Allen H. Gabor; Eric A. Lehner; Guoping Mao; Christopher Kemper Ober; Timothy E Long; Brian A. Schell; Richard C. Tiberio

doi:10.1117/12.154785

15 September 1993 Hydrosiloxane-modified styrene-diene block copolymer resists

Allen H. Gabor, Eric A. Lehner, Guoping Mao, Christopher Kemper Ober, Timothy E Long, Brian A. Schell, Richard C. Tiberio

Author Affiliations +

Proceedings Volume 1925, Advances in Resist Technology and Processing X; (1993) https://doi.org/10.1117/12.154785
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

Block copolymers are a class of polymers deserving of more investigation by the resist community. We are investigating styrene-hydrosiloxane modified diene block copolymers which have good properties for use as negative tone, electron sensitive resists. Resolution better than 0.1 micrometers , sensitivity of 30 (mu) C/cm² and contrast of 2.8 have been demonstrated using a poly(styrene)-pentamethyldisiloxane modified poly(isoprene) block copolymer (PS-b-PDPI). Used in a bilayer resist scheme, PS-b-PDPI has an oxygen RIE selectivity ratio of 42 with respect to poly(imide). A poly(styrene)-heptamethyltrisiloxane modified poly(butadiene) block copolymer (PS-b-HTPB) has an oxygen RIE selectivity ratio of 54 with respect to poly(imide). In a bilayer resist system, using PS-b-PDPI as the imageable layer, patterns of 0.3 micrometers wide lines and 1.5 micrometers wide spaces have been transferred through a 1.2 micrometers thick poly(imide) planarizing layer.

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Allen H. Gabor, Eric A. Lehner, Guoping Mao, Christopher Kemper Ober, Timothy E Long, Brian A. Schell, and Richard C. Tiberio "Hydrosiloxane-modified styrene-diene block copolymer resists", Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); https://doi.org/10.1117/12.154785

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