Model of the process of dissolution and swelling of thin polymethylmethacrylate films

Vladimir N. Genkin; M. Yu. Myl'nikov

doi:10.1117/12.154786

15 September 1993 Model of the process of dissolution and swelling of thin polymethylmethacrylate films

Vladimir N. Genkin, M. Yu. Myl'nikov

Proceedings Volume 1925, Advances in Resist Technology and Processing X; (1993) https://doi.org/10.1117/12.154786
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

In the fabrication of integrated circuits (IC) the solubility dependence of a polymer on its macromolecular length is used. The development process is multistage and involves series thicknesses just as in photo and plasma etching. In lithography this process is considered surface and its rate depends on average molecular mass. We expect that the dissolution rate is a time function and that it depends not only on M, but also on the mass-molecular distribution. We propose that the swelling factor is important too. The aim of this work is to construct a model of swelling and dissolution processes and to estimate the positive resists contrast dependence on the polymerization degree and solvent thermodynamic quality.

Citation Download Citation

Vladimir N. Genkin and M. Yu. Myl'nikov "Model of the process of dissolution and swelling of thin polymethylmethacrylate films", Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); https://doi.org/10.1117/12.154786

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