Molecular design for stabilization of chemical amplification resist toward airborne contamination

Hiroshi Ito; William Preston England; Nicholas J. Clecak; Gregory Breyta; Hoosung Lee; Do Y. Yoon; Ratnam Sooriyakumaran; William D. Hinsberg

doi:10.1117/12.154794

Translator Disclaimer

15 September 1993 Molecular design for stabilization of chemical amplification resist toward airborne contamination

Hiroshi Ito, William Preston England, Nicholas J. Clecak, Gregory Breyta, Hoosung Lee, Do Y. Yoon, Ratnam Sooriyakumaran, William D. Hinsberg

Author Affiliations +

Proceedings Volume 1925, Advances in Resist Technology and Processing X; (1993) https://doi.org/10.1117/12.154794
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

This paper describes the first logical approach to the design of chemical amplification resists that are stable toward airborne contamination. This molecular design is based on the observation that uptake of N-methylpyrrolidone (NMP) by thin polymer films is primarily governed by glass transition temperatures (T_g) of the polymers. This concept has led to the design of environmentally very robust chemical amplification resists that provide positive images upon development with aqueous base.

Citation Download Citation

Hiroshi Ito, William Preston England, Nicholas J. Clecak, Gregory Breyta, Hoosung Lee, Do Y. Yoon, Ratnam Sooriyakumaran, and William D. Hinsberg "Molecular design for stabilization of chemical amplification resist toward airborne contamination", Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); https://doi.org/10.1117/12.154794

ACCESS THE FULL ARTICLE