Paper
15 September 1993 Understanding the novolak synthesis reaction
Leonard E. Bogan Jr.
Author Affiliations +
Abstract
We describe new tools for the characterization of novolac resins, for the understanding of the novolac synthesis reaction, and for the prediction of resin structures. These tools have been used to optimize the performance of photoresists for microlithography. The current state-of- the-art describes novolac copolymer compositions as the ratio of monomers charged in the reaction, even though it is well known that the actual product composition is quite different. Quantitative 13C NMR spectroscopy provides a direct method for accurately determining copolymer composition by integrating methyl carbon resonances. By using this method to analyze the results of competition reactions, relative monomer and site reactivities for phenol and the cresols with formaldehyde have been determined. These observed reactivities have been used in a simple, kinetic model to accurately predict copolymer composition, branch density, and molecular weight.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Leonard E. Bogan Jr. "Understanding the novolak synthesis reaction", Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); https://doi.org/10.1117/12.154791
Lens.org Logo
CITATIONS
Cited by 2 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Polymers

Photoresist materials

Optical lithography

Error analysis

Polymerization

Carbon

Nitrogen

Back to Top