Translator Disclaimer
8 August 1993 Efficient spectral narrowing, tuning, and stabilization devices for KrF laser used in microlithography
Author Affiliations +
Efficient spectral narrowing, tuning, and stabilization devices characterized by improved energy efficiency and operating parameters have been constructed. The devices are used with KrF lasers intended for submicron lithography. Up to 5 pm spectral line narrowing is provided by two Fabry Perot etalons with thoroughly optimized parameters. They permit us to achieve unprecedented spectral narrowing energy efficiency of 50%. A special device based on a passively stabilized reference Fabry-Perot etalon is used for laser wavelength stabilization within 1 pm. A unique optical scheme of interference pattern formation is realized in the device; the laser wavelength is controlled by spatial location of fringes. The device also features precision wavelength tuning (approximately 0.1 pm), better resistance to electromagnetic noise, and higher operating characteristics.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alexander N. Novoselov, Victor G. Nikiforov, Alexander F. Silnitsky, and Boris F. Trinchuk "Efficient spectral narrowing, tuning, and stabilization devices for KrF laser used in microlithography", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993);


Five Watt Industrial Lithography Excimer Laser System
Proceedings of SPIE (October 11 1989)
Improvement of the ArF laser for photolithography
Proceedings of SPIE (May 26 1995)
Excimer Laser Stepper for Sub-half Micron Lithography
Proceedings of SPIE (July 25 1989)
Frequency-stabilized injection-locked laser
Proceedings of SPIE (April 03 2000)
Narrow Band KrF Excimer Laser Tunable And...
Proceedings of SPIE (December 16 1988)

Back to Top