Rim phase-shift mask combined with off-axis illumination: a path to .5lambda/NA geometries

Timothy A. Brunner

doi:10.1117/12.150474

8 August 1993 Rim phase-shift mask combined with off-axis illumination: a path to .5Λ/NA geometries

Timothy A. Brunner

Proceedings Volume 1927, Optical/Laser Microlithography; (1993) https://doi.org/10.1117/12.150474
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

Phase Shift Mask (PSM) approaches may be classified as either strong or weak. This paper addresses weak PSM approaches which are attractive because of their universal applicability to any pattern. A simple design algorithm for rim PSM, called Biased Rim Design (BiRD), is described. When used with normal stepper illumination ((sigma) equals .5), the modest benefits of rim PSM are of questionable value in many cases. However, theoretical considerations show a synergy of weak PSM combined with off-axis illumination. One specific combination termed BiRD/QUEST, is explored through a series of simulations. These results suggest that a properly biased weak PSM with appropriate illumination allows robust manufacturing of 0.5 (lambda) /NA lithographic patterns.

Citation Download Citation

Timothy A. Brunner "Rim phase-shift mask combined with off-axis illumination: a path to .5Λ/NA geometries", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); https://doi.org/10.1117/12.150474

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