New methods for generating microlenses by lithographic processes

Yoel S. Arieli; Michael Ben-Ezra; Naftali Paul Eisenberg

doi:10.1117/12.151101

13 August 1993 New methods for generating microlenses by lithographic processes

Yoel S. Arieli, Michael Ben-Ezra, Naftali Paul Eisenberg

Proceedings Volume 1972, 8th Meeting on Optical Engineering in Israel: Optoelectronics and Applications in Industry and Medicine; (1993) https://doi.org/10.1117/12.151101
Event: 8th Meeting in Israel on Optical Engineering, 1992, Tel Aviv, Israel

Abstract

Microlenses can be made by refractive and diffractive optics. A tailored distribution of light creates, in exposed photoresist, a three dimensional pattern, which is then reproduced by ion beam etching in the substrate, resulting in the desired microlens. The first technique uses a Fraunhofer diffraction pattern of a hole in the focal plane of a lens. The second technique uses diffractive optics, i.e. a Dammann grating, to generate a uniform array of equally spaced beams. The theoretical background of a Dammann grating and the experimental results are presented.

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Yoel S. Arieli, Michael Ben-Ezra, and Naftali Paul Eisenberg "New methods for generating microlenses by lithographic processes", Proc. SPIE 1972, 8th Meeting on Optical Engineering in Israel: Optoelectronics and Applications in Industry and Medicine, (13 August 1993); https://doi.org/10.1117/12.151101

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KEYWORDS

Microlens

Diffraction gratings

Far-field diffraction

Diffraction

Photoresist materials

Lithography

Optical engineering

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