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15 December 1993 Dry etching: path to coherent refractive microlens arrays
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Abstract
Reactive ion etching (RIE) is used to fabricate infrared refractive micro-optics in silicon. Three methods are used: binary optics technology which uses iterative steps of photolithography and RIE to create a multistep approximation to an aspheric profile; direct etching of a preshaped polymer microlens etch mask into the substrate; and analog etching of a lens profile directly into the substrate through a pinhole mask.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Margaret B. Stern and Theresa Rubico Jay "Dry etching: path to coherent refractive microlens arrays", Proc. SPIE 1992, Miniature and Micro-Optics and Micromechanics, (15 December 1993); https://doi.org/10.1117/12.165699
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