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1 February 1994 Ion beam milling of thin films for optical fabrication
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Abstract
The work reported here examines the roughness evolution of several thin films including gold, copper, aluminum and silicon; all applied to fused silica substrates. The films were deposited by an ion beam sputtering process and ranged in thickness from a few hundred nanometers to several micrometers. Roughness evolution during ion milling was evaluated by exposing the thin films to an argon ion beam and measuring roughness at regular intervals until the thin film was completely removed. These results suggest that roughness evolution depends on initial film roughness as well as depth of material removed.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Charles M. Egert "Ion beam milling of thin films for optical fabrication", Proc. SPIE 1994, Advanced Optical Manufacturing and Testing IV, (1 February 1994); https://doi.org/10.1117/12.167954
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