Bulk scatter measurements in fused silica at two wavelengths: a comparison with Rayleigh scatter theory

James Paul Black; Kirt C. Hickman

doi:10.1117/12.162656

1 December 1993 Bulk scatter measurements in fused silica at two wavelengths: a comparison with Rayleigh scatter theory

James Paul Black, Kirt C. Hickman

Proceedings Volume 1995, Optical Scattering: Applications, Measurement, and Theory II; (1993) https://doi.org/10.1117/12.162656
Event: SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation, 1993, San Diego, CA, United States

Abstract

Angle resolved scattering from bulk fused silica substrates has been measured at .442 micrometers and .633 micrometers . The angle dependent scatter pattern and wavelength dependence are compared to Rayleigh scatter theory. The measured bulk scatter data is applied to the measurement of fused silica substrate total scatter and the resulting measurement limitations imposed by bulk scatter.

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James Paul Black and Kirt C. Hickman "Bulk scatter measurements in fused silica at two wavelengths: a comparison with Rayleigh scatter theory", Proc. SPIE 1995, Optical Scattering: Applications, Measurement, and Theory II, (1 December 1993); https://doi.org/10.1117/12.162656

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