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12 November 1993 High heat flux mirror design for an undulator beamline
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Abstract
A-high-heat-load, horizontally deflecting/focusing mirror is designed for installation on an APS undulator beamline. The main design objective has been to keep the total tangential RMS slope error, including the thermally induced component, to less than 2 (mu) rad with an absorbed beam power on the mirror of 2 kW and a peak flux of 3.2 W/mm2. Extensive examination of various design parameters and detailed thermal/structural analyses has resulted in a mirror design that meets the tight slope-error requirement. Design features include a silicon substrate, a tailored pin-post cooling scheme, a moderate coolant flow rate, primary and secondary cooling areas, a multi-strip coating on the reflecting surface, and inlet/outlet cooling manifolds through an attached Ni-Fe mounting structure.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Thomas W. Tonnessen, Steven E. Fisher, Frank M. Anthony, David L. Lunt, Ali M. Khounsary, Kevin J. Randall, Efim S. Gluskin, and Wenbing Yun "High heat flux mirror design for an undulator beamline", Proc. SPIE 1997, High Heat Flux Engineering II, (12 November 1993); https://doi.org/10.1117/12.163827
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