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16 September 1993 Optomechanical design of 50-mm displacement measuring apparatus with nanometer accuracy
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Abstract
This paper describes the application of a two-frequency heterodyne interferometry in the micro-displacement measurement, and discusses the optomechanical design of the displacement measuring apparatus with high precision, long measuring range, high moving sensitivity, and high stability. The measuring uncertainty of this apparatus is +/- 7 X 10-3 micrometers within a 5 X 104 micrometers measuring range. This apparatus is mainly used in testing and calibrating linear displacement sensors.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yi-Ru Zhang, Ye-Qing Zhu, and Zu-Shan Shen "Optomechanical design of 50-mm displacement measuring apparatus with nanometer accuracy", Proc. SPIE 1998, Optomechanical Design, (16 September 1993); https://doi.org/10.1117/12.156625
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