Paper
15 February 1994 Design and fabrication of a reflection far-ultraviolet polarizer and retarder
Jongmin Kim, Muamer Zukic, Michele M. Wilson, Douglas G. Torr
Author Affiliations +
Abstract
New methods have been developed for the design of a far ultraviolet multilayer reflection polarizer and retarder. A MgF2/Al/MgF2 three-layer structure deposited on a thick opaque Al film (substrate) is used for the design of polarizers and retarders. The induced transmission and absorption method is used for the design of a polarizer and layer-by-layer electric field calculation method is used for the design of a quarterwave retarder. In order to fabricate these designs in a conventional high vacuum chamber we have to minimize the oxidation of the Al layers and somehow characterize the oxidized layer. X-ray photoelectron spectroscopy is used to investigate the amount and profile of oxidation. Depth profiling results and a seven layer oxidation model are presented.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jongmin Kim, Muamer Zukic, Michele M. Wilson, and Douglas G. Torr "Design and fabrication of a reflection far-ultraviolet polarizer and retarder", Proc. SPIE 2010, X-Ray and Ultraviolet Polarimetry, (15 February 1994); https://doi.org/10.1117/12.168569
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Cited by 3 scholarly publications.
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KEYWORDS
Aluminum

Polarizers

Oxidation

Magnesium fluoride

Reflectivity

Wave plates

X-rays

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