Synchrotrons for x-ray lithography

Francis C. Younger; Anthony P. Trippe

doi:10.1117/12.164796

29 November 1993 Synchrotrons for x-ray lithography

Francis C. Younger, Anthony P. Trippe

Proceedings Volume 2013, Electron-Beam Sources of High-Brightness Radiation; (1993) https://doi.org/10.1117/12.164796
Event: SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation, 1993, San Diego, CA, United States

Abstract

A synchrotron light source, from the Brobeck Division of Maxwell Laboratories, designed to operate at 1.2 GeV with a beam current of 400 mA was delivered to Louisiana State University (LSU) and commissioned in August 1992. This was the first commercially supplied light source in the United STAtes and its performance is described along with a discussion of its design and major subsystem operations. The bright radiation produced by the ring is currently used for thin layer resist lithography research, but future application plans include production operations. The experience gained and lessons learned during the LSU project have been applied to the design of a synchrotron in which a 100 mA beam will be accelerated to 2.5 GeV in a ring designed for lithography as applied to micromachining processes and the construction of nanodevices with extreme structural heights. Details of this larger ring design are discussed.

Citation Download Citation

Francis C. Younger and Anthony P. Trippe "Synchrotrons for x-ray lithography", Proc. SPIE 2013, Electron-Beam Sources of High-Brightness Radiation, (29 November 1993); https://doi.org/10.1117/12.164796

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