Thermal stability of Mo-based multilayer x-ray mirrors

Yoshikazu Ishii; Hisataka Takenaka; Tomoaki Kawamura; Tsuneyuki Haga; Hiroo Kinoshita

doi:10.1117/12.167991

1 February 1994 Thermal stability of Mo-based multilayer x-ray mirrors

Yoshikazu Ishii, Hisataka Takenaka, Tomoaki Kawamura, Tsuneyuki Haga, Hiroo Kinoshita

Proceedings Volume 2015, Applications of Laser Plasma Radiation; (1994) https://doi.org/10.1117/12.167991
Event: SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation, 1993, San Diego, CA, United States

Abstract

Mo-based multilayers show high reflectivities in the 8 - 20 nm region at normal incidence. We have evaluated the soft x-ray reflectivities and the effects of thermal annealing on both reflectivity and the layered structures of these Mo-based multilayers. The Cu-K (alpha) x-ray first-order Bragg-peak reflectivity of the Mo/Si multilayer markedly decreases at annealing temperatures above 400 degree(s)C. TEM observation reveals that the thermally induced deteriorations of Mo/B4C and Mo/SiC multilayers are smaller than those of the Mo/Si multilayer. The Mo/Si multilayer reflectivity at a wavelength of about 13 nm decreases greatly with 600 degree(s)C annealing. However, the Mo/B4C and Mo/SiC multilayers maintain higher reflectivities at the same wavelength. These results suggests that the Mo/B4C and Mo/SiC multilayers are superior to a Mo/Si multilayer in terms of thermal stability.

Citation Download Citation

Yoshikazu Ishii, Hisataka Takenaka, Tomoaki Kawamura, Tsuneyuki Haga, and Hiroo Kinoshita "Thermal stability of Mo-based multilayer x-ray mirrors", Proc. SPIE 2015, Applications of Laser Plasma Radiation, (1 February 1994); https://doi.org/10.1117/12.167991

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