Some optoelectric properties of chemically deposited thin films of nickel and cobalt oxides

A. Joseph Varkey; A. F. Fort

doi:10.1117/12.161970

22 October 1993 Some optoelectric properties of chemically deposited thin films of nickel and cobalt oxides

A. Joseph Varkey, A. F. Fort

Proceedings Volume 2017, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XII; (1993) https://doi.org/10.1117/12.161970
Event: SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation, 1993, San Diego, CA, United States

Abstract

For solar energy devices to become affordable to everyone, the need for developing modest techniques should be given priority attention. In our laboratory we have developed very simple methods for preparation of cobalt oxides, CoOOH and Co₃O₄, and nickel oxides NiO and NiOOH. They were deposited on glass substrates from solutions containing ammine complexes of the respective metal ions. For cobalt oxides, the initial deposition was of brown CoOOH, which was converted into black Co₃O₄ by annealing it at 590 K in air. The films were characterized by measuring their optical absorbance, transmittance, and reflectance in the spectral range of 300 - 900 nm. The data were used to calculate the spectral variation of their optical constants. Absorption spectra of the films were analyzed to obtain their optical band gaps. Some possible uses of these films are mentioned, and the prospects of this method for deposition of other oxide films are also discussed.

Citation Download Citation

A. Joseph Varkey and A. F. Fort "Some optoelectric properties of chemically deposited thin films of nickel and cobalt oxides", Proc. SPIE 2017, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XII, (22 October 1993); https://doi.org/10.1117/12.161970

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