You have requested a machine translation of selected content from our databases. This functionality is provided solely for your convenience and is in no way intended to replace human translation. Neither SPIE nor the owners and publishers of the content make, and they explicitly disclaim, any express or implied representations or warranties of any kind, including, without limitation, representations and warranties as to the functionality of the translation feature or the accuracy or completeness of the translations.
Translations are not retained in our system. Your use of this feature and the translations is subject to all use restrictions contained in the Terms and Conditions of Use of the SPIE website.
6 December 1993Building world-class microlithographic lens systems: optical material requirements and qualification methods
Building successive generations of state-of-the-art wide field, sub-micron microlithographic lens systems dictates ever-tightening material tolerances that challenge glass manufacturers. This paper discusses the optical material needs for microlithographic lens systems and Tropel's in-house material qualification program. Material qualification is divided into three successive stages: (1) fluorescence testing to qualitatively analyze color center characteristics of the material; (2) homogeneity testing to determine the relative volumetric variations in index; and (3) absolute index testing at multiple wavelengths to determine the material's dispersion characteristics.
The alert did not successfully save. Please try again later.
Paul R. DeStefano, Paul F. Michaloski, "Building world-class microlithographic lens systems: optical material requirements and qualification methods," Proc. SPIE 2018, Passive Materials for Optical Elements II, (6 December 1993); https://doi.org/10.1117/12.165236