Laser-beam writing for integrated-optic devices in Ti:LiNbO3

Masamitsu Haruna; Hiroshi Nishihara

doi:10.1117/12.167547

1 February 1994 Laser-beam writing for integrated-optic devices in Ti:LiNbO₃

Masamitsu Haruna, Hiroshi Nishihara

Proceedings Volume 2045, Laser-Assisted Fabrication of Thin Films and Microstructures; (1994) https://doi.org/10.1117/12.167547
Event: Optics Quebec, 1993, Quebec City, Canada

Abstract

This paper presents the recent topics of the laser-beam (LB) writing techniques for fabrication of integrated-optic devices in Ti:LiNbO₃ in addition to the practical LB writing system for channel waveguide patterning in photoresist. Recently, the direct LB writing of TiO₂ channels on LiNbO₃ was demonstrated, providing the photoresist-free process for fabrication of Ti:LiNbO₃ waveguides with higher accuracy and reproducibility. Besides the channel waveguide patterning, the interdigital electrodes required for TE-TM mode conversion in Ti:LiNbO₃ waveguide wavelength filters can be defined with an accuracy of the order of nanometer by a unique LB writing technique that is the so-called LB periodic-dot writing. The writing accuracy is discussed in detail as well as the performance of the fabricated filter.

Citation Download Citation

Masamitsu Haruna and Hiroshi Nishihara "Laser-beam writing for integrated-optic devices in Ti:LiNbO₃", Proc. SPIE 2045, Laser-Assisted Fabrication of Thin Films and Microstructures, (1 February 1994); https://doi.org/10.1117/12.167547

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