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1 February 1994 Synchrotron beamlines for x-ray lithography
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Louisiana State University established the J. Bennett Johnston, Sr., Center for Advanced Microstructures and Devices (CAMD). Designed and constructed by the Brobeck Division of Maxwell Laboratories, the CAMD synchrotron light source is the first electron storage ring to be built by a commercial company in the United States. The synchrotron x-ray radiation generated at CAMD is an extremely useful exposure source for both thin and thick film lithography. Passing through a beamline containing two plane mirrors, the synchrotron light is used to expose thin resists for lithography of patterns with feature sizes of 0.25 micron and smaller. Two thick-resist beamlines, one using a single aspheric (collimating) mirror and one using a plane mirror, provide the higher flux photons required for miniaturization in silicon to produce microscopic mechanical devices including gears, motors, filters, and valves.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anthony P. Trippe and W. Jorge Pearce "Synchrotron beamlines for x-ray lithography", Proc. SPIE 2045, Laser-Assisted Fabrication of Thin Films and Microstructures, (1 February 1994);


Design of synchrotron x-ray lithography beamlines
Proceedings of SPIE (July 09 1992)
Synchrotrons for x-ray lithography
Proceedings of SPIE (November 29 1993)
DUV synchrotron exposure station at CAMD
Proceedings of SPIE (June 29 1998)

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