CD results for 6 inch 250 mil PBS photoblanks for a 0.50 micron generation photomask process

Chris K. Keith

doi:10.1117/12.167250

15 February 1994 CD results for 6 inch 250 mil PBS photoblanks for a 0.50 micron generation photomask process

Chris K. Keith

Author Affiliations +

Proceedings Volume 2087, 13th Annual BACUS Symposium on Photomask Technology and Management; (1994) https://doi.org/10.1117/12.167250
Event: 13th Annual BACUS Symposium on Photomask Technology and Management, 1993, Santa Clara, CA, United States

Abstract

This paper discusses work done at Intel to meet CD specifications for a 0.50 micron generation photomask process using 6' 250 mil photoblanks coated with PBS resist. Initial CD uniformity results indicated that the develop tool was the main source of non-uniformity. To reduce the contribution of the develop tool, two strategies were pursued simultaneously to ensure that the within-plate linewidth uniformity (3 sigma) of the etched CD's would be 50 nm. The first strategy was to improve the capability of the current developer and to determine if any write parameters could be modified to allow for more process latitude. The second strategy was to evaluate new developers and identify a possible replacement. Both of these strategies will be presented with accompanying results for CD uniformity of the developed and etched CD structures.

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Chris K. Keith "CD results for 6 inch 250 mil PBS photoblanks for a 0.50 micron generation photomask process", Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); https://doi.org/10.1117/12.167250

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