Paper
15 February 1994 Characterization of defect sizing on an automatic inspection system (KLA238e)
Dave Stocker, Brian Martin, Jeffrey O. Browne
Author Affiliations +
Abstract
This paper describes the calibration of an automatic inspection system to size 5X reticle defects down to half-micron resolution, the defect printability limit of the stepper lens with which the 5X reticles are to be used. An enhanced technique using image analysis for defect sizing is also described. Whilst enabling more accurate defect sizing, this method is resolution limited in automatic operation.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dave Stocker, Brian Martin, and Jeffrey O. Browne "Characterization of defect sizing on an automatic inspection system (KLA238e)", Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); https://doi.org/10.1117/12.167271
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KEYWORDS
Reticles

Calibration

Inspection

Optical testing

Image analysis

Photomask technology

Defect detection

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