Chrome-level repair of phase-shift photomasks using conventional focused ion beam repair technology

William C. Joyce

doi:10.1117/12.167272

15 February 1994 Chrome-level repair of phase-shift photomasks using conventional focused ion beam repair technology

William C. Joyce

Proceedings Volume 2087, 13th Annual BACUS Symposium on Photomask Technology and Management; (1994) https://doi.org/10.1117/12.167272
Event: 13th Annual BACUS Symposium on Photomask Technology and Management, 1993, Santa Clara, CA, United States

Abstract

Applicability of conventional Focused Ion Beam photomask repair techniques is discussed in relation to chrome-level repair of phase-shift masks. Attention is paid to the underlying glass damage caused during chrome removal as well as the residual gallium staining. A technique used to control these issues is presented that does not require depth measurements prior to phase etch of the glass substrate. The applicability of this technique is discussed as it relates to full thickness chrome used in rim and alternating PSMs as well as the thin `leaky' chrome used for attenuated masks.

Citation Download Citation

William C. Joyce "Chrome-level repair of phase-shift photomasks using conventional focused ion beam repair technology", Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); https://doi.org/10.1117/12.167272

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