Cost of ownership for soft x-ray projection lithography

Kathleen Early; William H. Arnold

doi:10.1117/12.167276

15 February 1994 Cost of ownership for soft x-ray projection lithography

Kathleen Early, William H. Arnold

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Proceedings Volume 2087, 13th Annual BACUS Symposium on Photomask Technology and Management; (1994) https://doi.org/10.1117/12.167276
Event: 13th Annual BACUS Symposium on Photomask Technology and Management, 1993, Santa Clara, CA, United States

Abstract

We present a general analysis of cost of ownership for an integrated circuit production lithography system. We illustrate the method with examples from i-line and deep ultraviolet lithography, as well as soft x-ray projection lithography. Tool utilization is emphasized as well as system throughput. Our analysis suggests that with 20 wafer per hour throughput, which may be attainable with soft x-ray projection lithography, lithography costs will rise to four times today's i-line costs, or higher. In addition to throughput, reticles and photoresist will be cost drivers for this technology.

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Kathleen Early and William H. Arnold "Cost of ownership for soft x-ray projection lithography", Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); https://doi.org/10.1117/12.167276

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