Dimensional metrology of phase-shifting masks with scanning probe microscopes

Joseph E. Griffith; Herschel M. Marchman; Leslie C. Hopkins; Christophe Pierrat; Sheila Vaidya

doi:10.1117/12.167254

15 February 1994 Dimensional metrology of phase-shifting masks with scanning probe microscopes

Joseph E. Griffith, Herschel M. Marchman, Leslie C. Hopkins, Christophe Pierrat, Sheila Vaidya

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Proceedings Volume 2087, 13th Annual BACUS Symposium on Photomask Technology and Management; (1994) https://doi.org/10.1117/12.167254
Event: 13th Annual BACUS Symposium on Photomask Technology and Management, 1993, Santa Clara, CA, United States

Abstract

Critical dimension metrology of a phase-shifting mask must include depth as well as width measurements because both the phase and the lateral position of the transmitted photons must be controlled. Scanning probe microscopes are well suited to perform these measurements because they achieve high resolution simultaneously in all three dimensions. As with other microscopes, the probe-sample interaction strongly affects critical dimension measurement. The shape of the probe mixes with the measured object in an intrinsically nonlinear manner. We present measurements of phase-shifting masks performed with a scanning force microscope, and we discuss how they illustrate the capabilities and limitations of the technique.

Citation Download Citation

Joseph E. Griffith, Herschel M. Marchman, Leslie C. Hopkins, Christophe Pierrat, and Sheila Vaidya "Dimensional metrology of phase-shifting masks with scanning probe microscopes", Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); https://doi.org/10.1117/12.167254

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