Masks for Markle-Dyson optics

Andrew Grenville; Gerry Owen; Jeff A. Robinson; David Anthony Borkholder; Curtis W. Frank; Roger Fabian W. Pease; David A. Markle

doi:10.1117/12.167246

15 February 1994 Masks for Markle-Dyson optics

Andrew Grenville, Gerry Owen, Jeff A. Robinson, David Anthony Borkholder, Curtis W. Frank, Roger Fabian W. Pease, David A. Markle

Author Affiliations +

Proceedings Volume 2087, 13th Annual BACUS Symposium on Photomask Technology and Management; (1994) https://doi.org/10.1117/12.167246
Event: 13th Annual BACUS Symposium on Photomask Technology and Management, 1993, Santa Clara, CA, United States

Abstract

The optical performance of Markle-Dyson projection optics is now well established. Here we describe options for 1X reflective optical masks that might achieve the desired linewidth control. One option is the use of aluminum as the reflecting material. A film less than 50 nm thick has nearly twice the reflectivity of the silicon used until now, and so it should be possible to develop an etching process (for such a thin film) that is adequately precise. Moreover options exist for repairing both opaque and clear defects. An interesting alternative configuration, that eliminates the need to etch the aluminum, is to use a patterned absorber on the substrate and to deposit the aluminum over the patterned absorber.

Citation Download Citation

Andrew Grenville, Gerry Owen, Jeff A. Robinson, David Anthony Borkholder, Curtis W. Frank, Roger Fabian W. Pease, and David A. Markle "Masks for Markle-Dyson optics", Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); https://doi.org/10.1117/12.167246

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