Self-calibration in one dimension

Michael T. Takac

doi:10.1117/12.167251

15 February 1994 Self-calibration in one dimension

Michael T. Takac

Author Affiliations +

Proceedings Volume 2087, 13th Annual BACUS Symposium on Photomask Technology and Management; (1994) https://doi.org/10.1117/12.167251
Event: 13th Annual BACUS Symposium on Photomask Technology and Management, 1993, Santa Clara, CA, United States

Abstract

This document develops a 1D self-calibration method which calibrates a measuring tool with an uncalibrated artifact. The artifact is measured in more than one position, achieving a calibration that is approximately equal to the reproducibility of the measuring tool. The self- calibration method is targeted for the micro-lithography industry.

Citation Download Citation

Michael T. Takac "Self-calibration in one dimension", Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); https://doi.org/10.1117/12.167251

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