Paper
31 January 1994 Direct kinetic measurement of photochemical reaction of diazide-type photoresist by use of rapid-scan FTIR
K. Shoda, G. Katagiri, Hideyuki Ishida, Isao Noda
Author Affiliations +
Proceedings Volume 2089, 9th International Conference on Fourier Transform Spectroscopy; (1994) https://doi.org/10.1117/12.166799
Event: Fourier Transform Spectroscopy: Ninth International Conference, 1993, Calgary, Canada
Abstract
Kinetic behavior of a fast photochemical reaction of quinone diazide-type photoresist has been followed directly by a rapid-scan FT-IR. An intermediate species, ketene, rapid depletion of diazide and formation of carboxylic acid have been captured unambiguously. It has been demonstrated that a newly developed 2-D correlation formalism is very useful in the study of the reaction mechanism and kinetics of the photoresist including matrix polymer.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
K. Shoda, G. Katagiri, Hideyuki Ishida, and Isao Noda "Direct kinetic measurement of photochemical reaction of diazide-type photoresist by use of rapid-scan FTIR", Proc. SPIE 2089, 9th International Conference on Fourier Transform Spectroscopy, (31 January 1994); https://doi.org/10.1117/12.166799
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KEYWORDS
Photoresist materials

FT-IR spectroscopy

Infrared radiation

Absorption

Ultraviolet radiation

Polymers

Aluminum

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