Manufacturing integration of real-time laser interferometry to isotropically etch silicon oxide films for contacts and vias

Jake Pope Jr.; Robert Woodburn; J. Watkins; Roger B. Lachenbruch; Gregory Viloria

doi:10.1117/12.167339

15 February 1994 Manufacturing integration of real-time laser interferometry to isotropically etch silicon oxide films for contacts and vias

Jake Pope Jr., Robert Woodburn, J. Watkins, Roger B. Lachenbruch, Gregory Viloria

Author Affiliations +

Proceedings Volume 2091, Microelectronic Processes, Sensors, and Controls; (1994) https://doi.org/10.1117/12.167339
Event: Microelectronic Processing '93, 1993, Monterey, CA, United States

Abstract

Two methods, real-time in-situ and pre/post measurement, for control as well as issues associated with the laser interferometry method will be compared and discussed in this paper.

Citation Download Citation

Jake Pope Jr., Robert Woodburn, J. Watkins, Roger B. Lachenbruch, and Gregory Viloria "Manufacturing integration of real-time laser interferometry to isotropically etch silicon oxide films for contacts and vias", Proc. SPIE 2091, Microelectronic Processes, Sensors, and Controls, (15 February 1994); https://doi.org/10.1117/12.167339

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