Paper
15 February 1994 Optical emission spectroscopy on the GEC reference cell
Melisa J. Buie, Jeremiah T.P. Pender, T. Vincent, J. Holloway, Mary L. Brake, Michael E. Elta
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Abstract
Spatially resolved optical imaging experiments were conducted on an Ar plasma in a parallel plate reactor known as the Gaseous Electronics Conference RF Reference Cell. The experiment consisted of recording the optical emission discharges at pressures of 0.1 to 1.0 torr at 75 to 200 Vp-p for 1024 points across the electrode and at heights of 2.0, 6.0, 10.0, 14.0, 18.0, and 22 mm above the bottom powered electrode. Two argon neutral lines at 750.4 and 696 nm and two Ar ion lines at 427.8 and 488 nm were studied. The Ar plasma was found to be non uniform. The extent of the non uniformity varied, and in general was in the shape of annular rings with large intensities around the edges of the electrodes.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Melisa J. Buie, Jeremiah T.P. Pender, T. Vincent, J. Holloway, Mary L. Brake, and Michael E. Elta "Optical emission spectroscopy on the GEC reference cell", Proc. SPIE 2091, Microelectronic Processes, Sensors, and Controls, (15 February 1994); https://doi.org/10.1117/12.167341
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Cited by 5 scholarly publications.
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KEYWORDS
Etching

Plasma

Argon

Electrodes

Semiconducting wafers

Silicon

Emission spectroscopy

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