Damage thresholds and optical stabilities of fluoride HR coatings for 193 nm

Takao Izawa; N. Yamamura; R. Uchimura; T. Yakuoh

doi:10.1117/12.180929

28 July 1994 Damage thresholds and optical stabilities of fluoride HR coatings for 193 nm

Takao Izawa, N. Yamamura, R. Uchimura, T. Yakuoh

Author Affiliations +

Proceedings Volume 2114, Laser-Induced Damage in Optical Materials: 1993; (1994) https://doi.org/10.1117/12.180929
Event: Laser-Induced Damage in Optical Materials: 1993, 1993, Boulder, CO, United States

Abstract

We investigated the damage thresholds and optical stabilities of 193 nm fluoride HR coatings consisting of NdF₃/Na₃AlF₆ and LaF₃/Na₃AlF₃. These coatings were deposited on fused silica substrates by conventional electron beam (EB) and ion assisted deposition process (IAD). Damage thresholds of LaF₃/Na₃AlF₆ HRs were significantly increased by laser conditioning procedure and low index overcoating when they were deposited by EB and low energy IAD process. NdF₃/Na₃AlF₆ HRs showed negligible laser conditioning effect except certain few case, and had considerably lower damage thresholds than LaF₃/Na₃AlF₆ HRs with conditioning (1.8 J/cm²). Optical stabilities of these HRs were significantly improved by low energy IAD process (50 - 100 eV) which had not harmful influence on damage thresholds.

Citation Download Citation

Takao Izawa, N. Yamamura, R. Uchimura, and T. Yakuoh "Damage thresholds and optical stabilities of fluoride HR coatings for 193 nm", Proc. SPIE 2114, Laser-Induced Damage in Optical Materials: 1993, (28 July 1994); https://doi.org/10.1117/12.180929

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