Optical detection of CH3 during diamond chemical vapor deposition

David G. Goodwin; Nick G. Glumac; Evaldo J. Corat

doi:10.1117/12.178103

17 June 1994 Optical detection of CH3 during diamond chemical vapor deposition

David G. Goodwin, Nick G. Glumac, Evaldo J. Corat

Proceedings Volume 2124, Laser Techniques for State-Selected and State-to-State Chemistry II; (1994) https://doi.org/10.1117/12.178103
Event: OE/LASE '94, 1994, Los Angeles, CA, United States

Abstract

Measurements of CH₃ have been made using resonance-enhanced multiphoton ionization (REMPI) in two different diamond growth environments. Spatial profiles of methyl above the substrate have been measured in a filament- assisted reactor, which show that the CH₃ concentration is depleted near the substrate. The CH₃ concentration at the substrate shows an approximate Arrhenius dependence on substrate temperature below 1000 K, characterized by an activation energy of 4 kcal/mole. Methyl measurements were also made in 35 Torr hydrogen/oxygen flame into which methane is injected near the substrate. Radial profiles of methyl, acquired using REMPI, and of CH₄, acquired using sampling mass spectroscopy, are in good qualitative agreement with the results of numerical simulations.

Citation Download Citation

David G. Goodwin, Nick G. Glumac, and Evaldo J. Corat "Optical detection of CH3 during diamond chemical vapor deposition", Proc. SPIE 2124, Laser Techniques for State-Selected and State-to-State Chemistry II, (17 June 1994); https://doi.org/10.1117/12.178103

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