Variable-shaped electron beam lithography application for creation of diffractive optical elements

Sergey V. Babin; Victor A. Danilov

doi:10.1117/12.190216

12 October 1994 Variable-shaped electron beam lithography application for creation of diffractive optical elements

Sergey V. Babin, Victor A. Danilov

Proceedings Volume 2169, Nonconventional Optical Imaging Elements; (1994) https://doi.org/10.1117/12.190216
Event: International Colloquium on Nonconventional Optical Imaging Elements, 1993, Rydzyna-Rokosowo, Poland

Abstract

Peculiarities of variable shaped EBL application to DOE topology generation are regarded. The estimation of exposure data volume is proposed as a function of DOE parameters and approximation accuracy. A special software was developed to prepare DOE's exposure data. Experimental results on topology fabrication are presented for DOE focusing irradiation into a ring with ordered parameters, as well as artificial index gratings.

Citation Download Citation

Sergey V. Babin and Victor A. Danilov "Variable-shaped electron beam lithography application for creation of diffractive optical elements", Proc. SPIE 2169, Nonconventional Optical Imaging Elements, (12 October 1994); https://doi.org/10.1117/12.190216

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