Martensitic transformation in Ni50Ti50 films

Quanmin Su; Susan Z. Hua; Manfred R. Wuttig

doi:10.1117/12.174077

1 May 1994 Martensitic transformation in Ni₅₀Ti₅₀ films

Quanmin Su, Susan Z. Hua, Manfred R. Wuttig

Proceedings Volume 2189, Smart Structures and Materials 1994: Smart Materials; (1994) https://doi.org/10.1117/12.174077
Event: 1994 North American Conference on Smart Structures and Materials, 1994, Orlando, FL, United States

Abstract

The elasticity and anelasticity of Ni₅₀Ti₅₀ films deposited on Si substrates was studied yielding information on the damping and modulus softening. It was found that the transformation behavior strongly depends on the film thickness and approaches bulk Ni₅₀Ti₅₀ behavior as the film becomes a few micrometers thick. For the same film thickness, the transformation depends on the film/substrate adhesion. In films with good adhesion cross sectional transmission electron microcopy (TEM) reveals a thin parent phase layer which does not transform while the bulk part of the Ni₅₀Ti₅₀ film transforms. It is thus proposed that interface constraints stabilize the B2 structure. A microscopic interpretation in terms of transformation strains at the interface is given.

Citation Download Citation

Quanmin Su, Susan Z. Hua, and Manfred R. Wuttig "Martensitic transformation in Ni₅₀Ti₅₀ films", Proc. SPIE 2189, Smart Structures and Materials 1994: Smart Materials, (1 May 1994); https://doi.org/10.1117/12.174077

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