Comparative study of x-ray lithography process optimization using theoretical and empirical tools

Whitson G. Waldo; Cristiano Capasso; Azalia A. Krasnoperova; Mumit Khan; James Welch Taylor; Franco Cerrina

doi:10.1117/12.175833

13 May 1994 Comparative study of x-ray lithography process optimization using theoretical and empirical tools

Whitson G. Waldo, Cristiano Capasso, Azalia A. Krasnoperova, Mumit Khan, James Welch Taylor, Franco Cerrina

Proceedings Volume 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV; (1994) https://doi.org/10.1117/12.175833
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

This paper presents the results of a simple orthogonal matrix experiment testing photoresist performance as a function of post exposure bake temperature and time. The dose latitude of quarter micron line/space pairs is found under these conditions. These empirical results are compared against those produced under identical process conditions but utilizing simulated images based on resist dissolution rate data. The matrix responses of the empirical and simulated data sets are compared. Also, these linewidth results are compared against resist characteristic data produced under identical process conditions. The matrix responses of the three data sets are compared.

Citation Download Citation

Whitson G. Waldo, Cristiano Capasso, Azalia A. Krasnoperova, Mumit Khan, James Welch Taylor, and Franco Cerrina "Comparative study of x-ray lithography process optimization using theoretical and empirical tools", Proc. SPIE 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, (13 May 1994); https://doi.org/10.1117/12.175833

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