Development of a laboratory extreme-ultraviolet lithography tool

Daniel A. Tichenor; Glenn D. Kubiak; Michael E. Malinowski; Richard H. Stulen; Steven J. Haney; Kurt W. Berger; Rodney P. Nissen; G. A. Wilkerson; Phillip H. Paul; S. R. Birtola; P. S. Jin; Richard William Arling; Avijit K. Ray-Chaudhuri; William C. Sweatt; Weng W. Chow; John E. Bjorkholm; Richard R. Freeman; Marc D. Himel; Alastair A. MacDowell; Donald M. Tennant; Linus A. Fetter; Obert R. Wood II; Warren K. Waskiewicz; Donald L. White; David L. Windt; Tanya E. Jewell

doi:10.1117/12.175834

13 May 1994 Development of a laboratory extreme-ultraviolet lithography tool

Daniel A. Tichenor, Glenn D. Kubiak, Michael E. Malinowski, Richard H. Stulen, Steven J. Haney, Kurt W. Berger, Rodney P. Nissen, G. A. Wilkerson, Phillip H. Paul, S. R. Birtola, P. S. Jin, Richard William Arling, Avijit K. Ray-Chaudhuri, William C. Sweatt, Weng W. Chow, John E. Bjorkholm, Richard R. Freeman, Marc D. Himel, Alastair A. MacDowell, Donald M. Tennant, Linus A. Fetter, Obert R. Wood II, Warren K. Waskiewicz, Donald L. White, David L. Windt, Tanya E. Jewell

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Proceedings Volume 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV; (1994) https://doi.org/10.1117/12.175834
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

The development of a laboratory EUV lithography tool based on a laser plasma source, a 10x Schwarzschild camera, and a magnetically levitated wafer stage is presented. Interferometric measurements of the camera aberrations are incorporated into physical-optics simulations to estimate the EUV imaging performance of the camera. Experimental results demonstrate the successful matching of five multilayer reflecting surfaces, coated to specification for a wide range of figure and incidence angle requirements. High-resolution, 10x-reduction images of a reflection mask are shown.

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Daniel A. Tichenor, Glenn D. Kubiak, Michael E. Malinowski, Richard H. Stulen, Steven J. Haney, Kurt W. Berger, Rodney P. Nissen, G. A. Wilkerson, Phillip H. Paul, S. R. Birtola, P. S. Jin, Richard William Arling, Avijit K. Ray-Chaudhuri, William C. Sweatt, Weng W. Chow, John E. Bjorkholm, Richard R. Freeman, Marc D. Himel, Alastair A. MacDowell, Donald M. Tennant, Linus A. Fetter, Obert R. Wood II, Warren K. Waskiewicz, Donald L. White, David L. Windt, and Tanya E. Jewell "Development of a laboratory extreme-ultraviolet lithography tool", Proc. SPIE 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, (13 May 1994); https://doi.org/10.1117/12.175834

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