Direct inclusion of the proximity effect in the calculation of kinoforms

Jorgen Bengtsson

doi:10.1117/12.175819

13 May 1994 Direct inclusion of the proximity effect in the calculation of kinoforms

Jorgen Bengtsson

Proceedings Volume 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV; (1994) https://doi.org/10.1117/12.175819
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

Knowledge of the effects of fabrication using microlithography is essential when trying to reach a desired structure, i.e., when using proximity effect compensation. In this presentation, the particular case of diffractive microlenses, kinoforms, is studied. Normally, compensation for the proximity effect is done after the kinoform structure has been calculated with optical design methods. However, in this presentation it is shown that including the proximity effect already in the optical design methods leads to kinoforms whose optical quality is greatly improved.

Citation Download Citation

Jorgen Bengtsson "Direct inclusion of the proximity effect in the calculation of kinoforms", Proc. SPIE 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, (13 May 1994); https://doi.org/10.1117/12.175819

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available