Very simple data processing system for deep submicron nanofabrication

Shyi-Long Shy; Tan Fu Lei; C. H. Chu; Chun-Yen Chang; Sia Hau Lee; Wen-An Loong

doi:10.1117/12.175815

13 May 1994 Very simple data processing system for deep submicron nanofabrication

Shyi-Long Shy, Tan Fu Lei, C. H. Chu, Chun-Yen Chang, Sia Hau Lee, Wen-An Loong

Proceedings Volume 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV; (1994) https://doi.org/10.1117/12.175815
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

In this paper, a very simple data processing system for deep submicron nanofabrication was developed on a popular 80486 based personal computer using commercially available softwares: AutoCAD and ASM3500. Each personal computer can communicate with the control computer (Micro Vax 3900) in the JBX-5DII electron-beam system using the Telnet and FTP software. Deep submicron patterning on wafer and chromium photomask were done using well established electron-beam direct write technology and evaluated using AFM and SEM. Although most electron-beam systems supply text editing program, it is hard to use even for compact pattern data and cannot inspect the overlaying of the patterns. This system can be of great cost-effective value in researching applications for nanofabrication too.

Citation Download Citation

Shyi-Long Shy, Tan Fu Lei, C. H. Chu, Chun-Yen Chang, Sia Hau Lee, and Wen-An Loong "Very simple data processing system for deep submicron nanofabrication", Proc. SPIE 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, (13 May 1994); https://doi.org/10.1117/12.175815

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