Dissolution behavior of the chemically modified polyvinylphenol with introduced high-ortho structure

Kenji Honda; Sydney G. Slater; Bernard T. Beauchemin Jr.; Medhat A. Toukhy; Sobhy P. Tadros; Toshiaki Aoai; Yasumasa Kawabe

doi:10.1117/12.175367

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16 May 1994 Dissolution behavior of the chemically modified polyvinylphenol with introduced high-ortho structure

Kenji Honda, Sydney G. Slater, Bernard T. Beauchemin Jr., Medhat A. Toukhy, Sobhy P. Tadros, Toshiaki Aoai, Yasumasa Kawabe

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Proceedings Volume 2195, Advances in Resist Technology and Processing XI; (1994) https://doi.org/10.1117/12.175367
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

Poly (p-vinylphenol) was derivatized by reaction with ortho- methylolated precursors to introduce ortho-ortho linked phenolic diad and triad moieties onto the polyethylene backbone. In particular, the resulting polymers obtained by the reaction with 2,4-dimethyl-6-methylolphenol were characterized by spectroscopic and lithographic methods to understand the structure/property relationship. The reaction took place in a sequential fashion so that the diad formation was followed by the triad formation. The diad was found to have two conformations, corresponding to hydrogen-bonded and -unbonded states, while the triad existed only in the hydrogen-bonded conformation. The dissolution behavior of the modified polymers with and without DNQ ester was greatly affected by the degree of HMX incorporation. Optimized resist performance determined by dissolution rate monitoring was obtained on modification of all phenolic moieties with a diad/triad ratio of approximately 1.

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Kenji Honda, Sydney G. Slater, Bernard T. Beauchemin Jr., Medhat A. Toukhy, Sobhy P. Tadros, Toshiaki Aoai, and Yasumasa Kawabe "Dissolution behavior of the chemically modified polyvinylphenol with introduced high-ortho structure", Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); https://doi.org/10.1117/12.175367

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